Embark with us on a journey of growth and transformation as we create exceptionally engineered technology and bring AI everywhere. As a valued team member, your adaptability and attention to detail will contribute to our drive for results and relentless pursuit of quality, ensuring we meet our customers' needs with precision. Join us and build on our legacy of innovation and collaboration as we deliver world-changing technology that improves the life of every person on the planet. The mask metrology group at Intel Mask Operations is looking for an engineer who has a background and strong interest in science/engineering to work on nanometer-scale computer vision and metrology applications. Responsibilities may include algorithm development and programming for CD-SEM image analysis and other image-based measurements. This a great opportunity to work directly with users to develop internal software tools and to have access to millions of images for developing new algorithms and applications in image analysis that will get used in a production environment for mask and semiconductor manufacturing. We are looking for someone willing to work relatively independently, helping to define requirements, implementing new features and helping to ensure that the software is reliable by developing and implementing test plans. Because this is a manufacturing facility, you should also be prepared to document any changes to software running in the production environment and review the changes during meetings with internal stakeholders.
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Job Type
Full-time
Career Level
Entry Level
Education Level
Ph.D. or professional degree